Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

SJR Rank #13,428H-index: 131SJR: 0.431Best quartile: Q2
Publisher

AVS Science and Technology Society

Country

United States

Type

journal

SJR by Edition

2022202500.150.30.450.6

Subject Categories

  • Condensed Matter PhysicsQ2
  • Surfaces, Coatings and FilmsQ2
  • Surfaces and InterfacesQ3

Areas: Materials Science · Physics and Astronomy

Most published research topics

Semiconductor materials and devicesMetal and Thin Film MechanicsPlasma Diagnostics and ApplicationsIon-surface interactions and analysisDiamond and Carbon-based Materials ResearchElectron and X-Ray Spectroscopy TechniquesCopper Interconnects and ReliabilityZnO doping and propertiesSurface and Thin Film PhenomenaElectronic and Structural Properties of Oxides

Source: OpenAlex

Publication Statistics

2025 Docs3-Year DocsCitable Docs02505007501000

Documents per Year

20222025085170255340

Detailed Information

ISSN

1520-8559, 0734-2101

SJR Best Quartile

Q2

Region

Northern America

Citations per Document (2 years)

2.32

References per Document

45.60

Coverage

1970, 1982-2026

Scope

In 1983, the two journals, Journal of Vacuum Science and Technology A and B were launched when the original Journal of Vacuum Science and Technology was split. JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas. JVSTA publishes reports that advance the fundamental understanding of interfaces and surfaces at a fundamental level and that use this understanding to advance the state of the art in various technological applications. The scope includes, but is not limited to, the following topics: -Applied and fundamental surface science -Atomic layer deposition -Electronic and photonic materials and their processing -Magnetic thin films and interfaces -Materials and thin films for energy conversion and storage -Photovoltaics, including inorganic and organic thin-film solar cells -Plasma science and technology, including plasma-surface interactions, plasma diagnostics plasma deposition and etching, and applications of plasmas to micro- and nanoelectronics -Surface engineering -Thin film deposition, etching, properties, and characterization -Transmission electron microscopy, including in situ methods -Tribology

Metrics from SCImago Journal Rank 2025. View on SCImago